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MF139200 - SEMI MF1392 - Test Method for Determining Net Carrier Density Profiles in Silicon Wafers by Capacitance-Voltage Measurements with a Mercury Probe StdPbc-1214 • Protection of the recipes

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Description

• Protection of the recipes in equipment from non-privileged access by defining protected recipe spaces per purposes

or any other party interested

SEMI M53-0220 (technical revision)

The purpose of this Document is to define a test method to characterize the surface composition of passivated 316L stainless steel components being considered for installation into a high-purity gas distribution system

SEMI MF81-01 (first SEMI publication)

MF139200 - SEMI MF1392 - Test Method for Determining Net Carrier Density Profiles in Silicon Wafers by Capacitance-Voltage Measurements with a Mercury Probe StdPbc-1214 • Protection of the recipesThis Test Method covers the measurement of net carrier density and net carrier density profiles in epitaxial and polished bulk silicon wafers in the range from about 4 1013 carriers cm3 to about 8 1016 carriers cm3 (resistivity range from about 0. 1 cm to about 100 cm in n type wafers and from about 0. 24 cm to about 330 cm in p type wafers). This Test Method requires the formation of a Schottky barrier diode with a mercury probe contact to an

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