E01400 - SEMI E14 - Measurement of Particle Contamination Contributed to the Product from the Process or Support Tool StdPbc-1017 SEMI G71-0996 (Reapproved 0823)

SEMI G71-0996 (Reapproved 0823)

SEMI MF978 — Test Method for Characterizing Semiconductor Deep Levels by Transient Capacitance Techniques

pass/fail criteria

The resulting information may be used to assess the uniformity of the film itself or of the layer formation process

and wafer size transition

E01400 - SEMI E14 - Measurement of Particle Contamination Contributed to the Product from the Process or Support Tool StdPbc-1017 SEMI G71-0996 (Reapproved 0823)NOTICE: This document was withdrawn in accordance with the Regulations Governing SEMI Standards in 2003. The purpose of this document is to provide a standardized methodology and detailed procedure for measuring the contamination performance of a particular process or tool in terms of the number and size distribution of particles added to a silicon wafer as a result of having been passed through that process tool. Referenced SEMI Standards SEMI M10